• Fri. Nov 22nd, 2024

UoH Ranked Sixth Best University In NIRF 2020 Rankings

UoH Alumnus Selected As Research Scholar At AIIMSUoH Alumnus Selected As Research Scholar At AIIMS

Hyderabad, June 12 (Hydnow): University of Hyderabad (UoH) has once again been ranked among India’s best educational institutions for the year 2020 according to National Institutional Ranking Framework (NIRF) a government of India-backed survey. The rankings 2020 were developed from more than 5000 institutes that had applied. According to the rankings released by the Ministry of Human Resource Development the UoH is ranked 6th among all Universities in the country. More than 200 Universities were surveyed for the rankings.

Union Human Resource Development Minister Dr. Ramesh Pokhriyal ‘Nishank’ on June 11 released the National Institutional Ranking Framework (NIRF) Ranking 2020. He was live with Minister of State . Sanjay Dhotre and Chairman of AICTE, Dr. Anil Saharsrabudhe and UGC Chairman Dr. DP Singh through a webcast to announce the rankings. Every year, MHRD ranks the universities and institutions of India based on the predetermined parameters.

Responding to these rankings, Prof. Appa Rao Podile, Vice Chancellor said, “We are happy to have been ranked among the Top Universities in the country. We have to work hard, as we have identified a few gaps to move up in the ranking system. UoH will increase its efforts to ensure that it is recognized as a top institution not only in India, but also internationally for its quality of teaching, outreach, inclusivity and research”.

Advertisements

The NIRF methodology draws from the overall recommendations and a broad understanding arrived at by a Core Committee set up by the MHRD. The parameters broadly cover “Teaching, Learning and Resources,” “Research and Professional Practices,” “Graduation Outcomes,” “Outreach and Inclusivity,” and “Perception”. Placements, research publications, outreach programmes are all key parameters within the above.(Hydnow)

Leave a Reply

Your email address will not be published. Required fields are marked *